Audited Supplier
BS-4050
3 YEARS
50x-500x
Industrial Inspection Microscope
≥Three
Desktop
Without Stereoscopic Effect
Ordinary Light
Cylindrical Shaped Lens
Teaching, Research
Optics
Infinity Color Corrected Optical System
High eye point wide field plan eyepiece PL10X/25mm
Sextuple BD nosepiece
8 inches three-layer mechanical stage
5x, 10x, 20x, 50x
12V/100W Halogen light
Low-position coaxial coarse and fine focusing
BestScope
Strong Carton with Polyfoam Protection
Beijing
Product Description
Introduction
Equipped with varisized wafer holders (including 6/8 inches), BS-4050 is professionally applied for wafer and flat panel display detection. More comfortable, flexible and quicker operation is available with upgraded ergonomics design.Features
1. Multi optional splitting ratio
2. Stable frame
All metal frame with the characteristics of low center, high rigidity and stability for professional industrial inspection, ensures to present a stable and clear image.
All metal frame with the characteristics of low center, high rigidity and stability for professional industrial inspection, ensures to present a stable and clear image.
High-performance nosepiece with precision bearing, is available for light and handy operation, precision resetting, controllable concentricity.
4. Large travel mechanical stage
6 inches stage for option, size: 445mm*240mm, moving range: 158mm×158mm.
8 inches three-layer mechanical stage, size: 525mm*330mm, moving range: 210mm*210mm, is professionally applied for industrial inspection of wafer, FPD, circuit package, PCB, materials, casting metal ceramic part, abrasive tools and so on.
Specification
| Item | Specification | BS-4050 | |
| Optical System | Infinity Color Corrected Optical System | * | |
| Viewing Head | 30° inclined infinity trinocular head, erect image, interpupillary distance: 50-76mm, splitting ratio:100:0 or 0:100 | * | |
| 30° inclined infinity trinocular head, inverted image, interpupillary distance: 50-76mm, splitting ratio:100:0, 20:80 or 0:100 | ○ | ||
| 5-35° adjustable, inverted image, tilting trinocular head, interpupillary distance: 50-76mm, splitting ratio:50:50, 100:0 or 0:100 | ○ | ||
| Eyepiece | High eye point wide field plan eyepiece PL10X/25mm, with adjustable diopter | * | |
| High eye point wide field plan eyepiece PL10X/25mm, with reticle and adjustable diopter | ○ | ||
| Objectives | BD Semi-Apochromatic Metallurgical Objectives | 5X/NA=0.15, WD=13.5mm | * |
| 10X/NA=0.3, WD=9mm | * | ||
| 20X/NA=0.5, WD=2.5mm | ○ | ||
| 50X/NA=0.8, WD=1mm | ○ | ||
| 100X/NA=0.9, WD=1mm | ○ | ||
| Ultra-Long Working Distance BD Semi-Apochromatic Metallurgical Objectives | 20X/NA=0.4, WD=8.5mm | * | |
| Infinity Long Working Distance BD Semi-Apochromatic Metallurgical Objectives | 50X/NA=0.55, WD=7.5mm | * | |
| 100X/NA=0.8, WD=2.1mm | ○ | ||
| 100X/NA=0.8, WD=3.5mm | ○ | ||
| Bright Field Semi-Apochromatic Metallurgical Objectives | 5X/NA=0.15, WD=19.5mm | ○ | |
| 10X/NA=0.3, WD=10.9mm | ○ | ||
| 20X/NA=0.5, WD=3.2mm | ○ | ||
| 50X/NA=0.8, WD=1.2mm | ○ | ||
| 100X/NA=0.9, WD=1mm | ○ | ||
| Nosepiece | Sextuple BD nosepiece, with DIC slot | * | |
| Quintuple BD nosepiece, with DIC slot | ○ | ||
| Sextuple bright field nosepiece, with DIC slot | ○ | ||
| Septuple bright field nosepiece, with DIC slot | ○ | ||
| Frame | Reflected frame with low position coaxial focusing mechanism, coarse range: 33mm, fine precision: 0.001mm, with upper limit and tension adjustment. Built-in 100-240V wide voltage system, with brightness setting button and reset button. | * | |
| Stage | 8 inches three-layer mechanical stage with low position coaxial adjustment, size: 525mm*330mm, moving range: 210mm*210mm, with clutch handle for quick movement. Glass plate for reflected use. | * | |
| 6 inches three-layer mechanical stage with low position coaxial adjustment, size: 445mm*240mm, moving range for reflected: 158mm*158mm, moving range for transmitted: 100*100mm, with clutch handle for quick movement. Glass plate for transmitted and reflected use. | ○ | ||
| Illumination | Bright field/ dark field reflected illuminator, with variable aperture and field diaphragm, center adjustable; with switch device for bright field and dark field; with filter slot and polarizing slot. | * | |
| Halogen light box, 12V/100W, with center set, for transmitted and reflected use | * | ||
| Halogen light, 12V/100W | * | ||
| Polarizer and Analyzer | Polarizer and fixed analyzer | ○ | |
| Polarizer and 360 degree rotatable analyzer | * | ||
| Rotating Workbench | Rotating workbench. 8-inch wafer plate, for 6, 8 inches wafer | ○ | |
| Interference Filter | Blue interference filter for reflected use: <=480nm | ○ | |
| Green interference filter for reflected use: 520nm-570nm | ○ | ||
| Red interference filter for reflected use: 630nm-750nm | ○ | ||
| Interference filter for reflected use, color balance plate (white light), suitable for halogen lamps | * | ||
| DIC | DIC kit | ○ | |
| Adapter | 0.35X C-mount adapter, focus adjustable | ○ | |
| 0.5X C-mount adapter, focus adjustable | ○ | ||
| 0.65X C-mount adapter, focus adjustable | ○ | ||
| 1X C-mount adapter | ○ | ||
| Other Accessories Other | High precision micrometer | ○ | |
| Internal hexagonal Spanner M4 | * | ||
| Internal hexagonal Spanner M5 | * | ||
Note: · Standard Outfit, ○ Optional
Accessories
1. Internationally advanced eyepiece with large field of view
10X/25mm eyepiece is plan and clear even at the edge of FOV, helpful to present more complete image of the sample.
10X/25mm eyepiece is plan and clear even at the edge of FOV, helpful to present more complete image of the sample.
2. Long working distance objectives
A whole set of professional semi-APO metallurgical objectives, adopt the lenses with high transmission and advanced coating technology.
Long working distance objectives for option, is efficient to prevent sample damage.
A whole set of professional semi-APO metallurgical objectives, adopt the lenses with high transmission and advanced coating technology.
Long working distance objectives for option, is efficient to prevent sample damage.
3. Nomarski differential interference contrast system
Using high-performance DIC attachment, the impalpable height difference under bright field can be transformed to high contrast light difference as 3D relief. It is widely applied for detection of LCD conducting particle and surface scratch of precision disk.
Using high-performance DIC attachment, the impalpable height difference under bright field can be transformed to high contrast light difference as 3D relief. It is widely applied for detection of LCD conducting particle and surface scratch of precision disk.
4. C-mount adapter
5. Interference filters
6. Polarizer and analyzer
7. Other Accessories
System Diagram
Dimension
