Sputtering Target: Titanium Sputtering / Arc Target with Different Materials

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Zhongzheng Yejin Technology Co., Ltd.

VIP   Audited Supplier 8 years
Profile Certified by SGS/BV
Square, Round, Rotary, particle, silk, Customized
Sputtering Target Titanium
Vacuum Coating
Forged
GR2
Square, Round, Rotary,Particle, Silk ,Customized
szzzyj
Wooden Case
According drawing
China
Product Description
Product Description

Products attributes of Ti sputtering target
 

NameMetal Titanium Sputtering Target (Ti Target)
MaterialTitanium Metal Materials
Purity99.9%-99.995%, 3N,3N5,4N,4N5
SizeD50.8x3mm, 2inch,3inch,Or As Request
ColorMetallic Color
ShapePlanar/Round/Plate/Rotary/Bar , As Request.
SurfacePolished Surface
Ti Density4.54g/cm3
Ti Melting Point1668°C
ApplicationPVD Film Coating,Optical Thin Film Coating,Industry Usage,Process,Semidoductor area,Experiments etc
Related ItemAl,Mg,Cu,Ni,Co,Fe,Zn,Sn,Bi,Ga,Ge,In,V,W,Mo,Nb,Ta,Cr,Zr,Ti,Hf etc + Metal Alloy sputtering targets+Ceramic targets
NoteSupport customize size,shape,purity,different alloy proportion etc.
Contact us firstly (Price is based on size and purity)

Item Name

High purity titanium (Ti) target

Purity

99.9%~99.999%,Grade1 to Grade 5

Shape

Square/Round, According to your request

Available size

Round: dia 25~300mm,Thickness:3~10mm

Rectangular: Length up to 1500mm

Customization is available

Certificates

ISO9001:2008, SGS, The third test report

Technics

Vacuum Melting, Patented thermo-mechanical process

Application

Widely used in coating processing industries

A: Solar Photovoltaic Application.

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.

 

Quality Standard (99.999% Ti)

Element

Value(<ppm)

Element

Value (<ppm)

Element

Value(<ppm)

Ag

0.05

Al

0.11

As

0.03

Au

0.05

B

0.01

Ba

0.005

Be

0.005

Bi

0.01

Br

0.05

Ca

0.2

Cd

0.05

Ce

0.005

Hg

0.1

Fe

3.2

Ga

0.05

I

0.01

Ge

0.05

Hf

0.01

The following table is a component analysis certificate for  5N Ti sputtering target. The analytical methods used are: 
1. Analysis of metal elements using GDMS or ICP-OES; 
2. Gas element analysis using LECO.
 

ElementsActualSpecUnitsElementsActualSpecUnitsElementsActualSpecUnits
Li<0.005 ppmZn<0.02 ppmPr<0.005 ppm
B<0.01 ppmGa<0.05 ppmNd<0.005 ppm
F<0.05 ppmBr<0.05 ppmSm<0.005 ppm
Na<0.01 ppmAs<0.05 ppmEu<0.005 ppm
Mg<0.01 ppmSe<0.05 ppmRu<0.01 ppm
Al0.59 ppmZr0.34 ppmRh<0.05 ppm
Si0.16 ppmNb<0.2 ppmGd<0.005 ppm
P<0.01 ppmMo<0.05 ppmTb<0.005 ppm
Cl0.05 ppmPd<0.01 ppmCd<0.05 ppm
K<0.01 ppmAg<0.02 ppmBe<0.005 ppm
Ca<0.5 ppmSn<0.05 ppmSc<0.05 ppm
TiMatrix wt%Sb<0.05 ppmRb<5 ppm
V0.03 ppmBa<0.005 ppmYb<0.005 ppm
Tasource ppmDy<0.005 ppmLu<0.005 ppm
W<0.01 ppmHo<0.005 ppmAu<0.05 ppm
Pt<0.05 ppmBi<0.01 ppmHg<0.1 ppm
Ti<0.01 ppmTh<0.0001 ppmHf<0.01 ppm
Pb<0.01 ppmU<0.0001 ppmIr<0.01 ppm
Re<0.01 ppmEr<0.005 ppmCe<0.005 ppm
Os<0.01 ppmTm<0.005 ppmC<5 ppm
Cr0.73 ppmIn<0.05 ppmS0.45 ppm
Mn1 ppmTe<0.05 ppmO270 ppm
Fe7.7 ppmI<0.05 ppmN5 ppm
Co<0.005 ppmCs<0.01 ppmH<1 ppm
Ni0.05 ppmLa<0.005 ppm    
Cu0.58 ppmGe<0.005 ppm    
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